NASCAM V 4.7.X
is a software suite to simulate the deposition, surface diffusion, nucleation, film growth, evolution of surface structures, and evaluation of their physical properties.
It is based on kinetic Monte Carlo method.
It allows to mimic film growth based on vacuum deposition methods among others.
Within the framework of a virtual coater (see right), the user defines the condensing species as well as their energy and angular distributions. Those can be found in litterature or evaluated analytically or by using plasma simulation software. ICS can help for that.
The film is then growth in a couple of hours and the user can analyse its properties.
Researchers can us NASCAM for
Teachers can use NASCAM to illustrate nanotechnology based courses, industrial
V 4.7.X Features:
Two types of crystals: cubic and hexagonal
Simulation of metallic and reactive deposition
Surface diffusion based on fixed list of thermally activated jumps
Several deposition fluxes: neutral and ionized fluxes of a two metals and neutral and ionized fluxes of a reactive particles (O, N, …)
Concommitent bombardment of inert gas flux: neutral or ionized
Energy and momentum transfer from incident flux to a film
Fast and powerful, simulation of deposition of up to 107 particles in several hours (depending on simulation parameters)
• Suitable for simulation of simple or amorphous films
• Simple and friendly user interface
• To setup simulations and to analyze simulation results, a number of plugins are included (see below)